Projection Scanning Technology
Tamarack’s projection scanning technology provides excellent exposure uniformity for large area lithography. Scanning with a diamond-shaped high intensity homogenized beam that overlaps adjacent scans by 50%, allows for significant distance between the mask and substrate, delivering precise scan velocity control. The mask and wafer are rigidly mounted on a scanning stage, while the system scans in a serpentine pattern with controlled velocity in the X-axis and precision stepping in the Y-axis.
Serpentine Scanning Pattern: The system scans in a serpentine pattern with controlled velocity on the X-axis and precision stepping on the Y-axis. Excellent exposure uniformity is achieved over the entire exposure area by scanning with a diamond-shaped homogenized beam, overlapping adjacent scans by 50%, and precisely controlling the scan velocity.