Large Area Proximity Mask Aligner
There are a number of process applications, where proximity printing provides higher yields when compared to contact printing. These applications include lithography on rough substrates such as ceramics, and those exhibiting significant topography. These can contaminate or damage the artwork, which in turn can greatly affect yields and production costs.
Tamarack’s line of large area proximity mask aligners offers non-contact photolithography to greatly minimize contact related problems, such as repeated defects. Proximity gapping (separation between the mask and the substrate) can be varied to accommodate various process applications. These aligners are designed to transfer the full image of the mask in a single exposure, thus maintaining high throughput levels. Precise image transfer is assured with Tamarack’s large area collimated light sources.
Accurate layer to layer alignment is assured by CCD cameras with zoom or fixed magnification optics and precision stepper motor driven x-y-theta stages with 0.5 micron steps.
Since the early 1980’s Tamarack has been manufacturing Mask Aligners with world wide installations. Most of these systems are still in use today.
Please contact Tamarack for a solution to your specific application.
