Collimated Contact UV Exposure Systems
As electronic circuits continue to set new records for density and complexity, and new chip mounting technologies develop, ever more precise exposure systems are vital. 
Tamarack’s highly collimated UV exposure systems provide the highest resolution obtainable in a contact exposure system, with resolution capabilities below 1 mil lines and spaces in standard dry film resist. Collimated systems are unique, in that they produce accurate pattern replication over the entire exposure area, from small substrates to large back planes. A registration accuracy of up to +/- 5 microns insures accurate alignment necessary for critical Soldermask and Outlerlayers substrates.
Tamarack’s collimated exposure systems were introduced over 20 years ago with a majority of these systems still reliably producing features to meet the demands needed by todays technology.
We have added efficient automatic panel handling, and highly accurate pattern recognition based automatic registration capabilities to our newest products. As a result, these systems are used to produce the most demanding fast data transfer, high I/O count and advanced telecommunications interconnect boards.
