Model 401 Projection Stepper

The Yield Enhancement Tool for dimensionally unstable panels

Projection lithography is the next step in fine line imaging for interconnects.

Tamarack’s Model 401 has a step and repeat architecture that provides the ability to align, scale the image, and expose each site individually on panels up to 12” x 12” in size.

Variable Magnification Lens

Tamarack’s Model 401 provides the flexibility of scaling the projected image to more closely match the existing pattern to which alignment is required. This can be accomplished based on a preprogrammed setting, or automatically as part of the automatic panel alignment sequence. Lens magnification is nominally set to 1:1 and can be varied by ± 400 PPM. Two methods are available:

  1. Global compensation, for cases where the variation is uniform over the entire substrate (isotropic).
  2. Individual site compensation, applicable to cases where the variation is non uniform (anisotropic).

Key Features & Benefits
  • Lens with a 5” diameter field allows exposure of an extended range of sites without stitching of multiple smaller fields.
  • Variable magnification compensates for mask/substrate mismatch.
  • Large depth of focus permits use of thick resists.
  • Efficient optical path for best possible throughput.
  • Global and individual site alignment provides accurate registration
  • Off axis alignment cameras with TTL auto-calibration option for maximum flexibility in target placement.
  • Dark and bright field illumination to find virtually any target.
  • The option of manual or fully automatic loading of masks and substrates offers added flexibility.

Note: All specifications are subject to change without notice.

Home | About | Products | Applications | Library | Careers | Contact | Site Map

Copyright © 2004, Tamarack Scientific Co., Inc.