Tamarack Scientific Co., Inc.

Model 264 Japanese Advertisement	Collimated Contact Exposure System with Automatic Alignment
Tamarack’s Model 264 provides the controlled collimation required for fine line imaging, high intensity, good uniformity, and precise alignment. Tamarack is dedicated to providing extensive customer support and also offers the capability to customize systems for your unique requirements.
Standard Features		Click for larger image
Automatic Artwork to Substrate alignment Automatic Artwork to Artwork alignment Global and selectable Quadrant Alignment (Recipe Driven) Full Field or selectable Quadrant Exposure) True 1 to 1 replication of phototool image to panels Modular drawer inserts for quick change of substrate size Double sided collimated exposure Easy to use recipe driven software (Windows) Touch Screen Controls Ideal for soldermask & outer / inner layers all on the same tool


Features & Benefits	Exposure Sample 16 um features using a 25 um thick Shipley photoresist #7025
Brief Description: The Model 264 is a stand alone Dual Sided alignment and exposure system. It uses a state of the art Pattern Recognition System that incorporates dual viewing optics and CCD cameras, for automatic artwork to substrate and artwork to artwork alignment. These automatic features eliminate operator induced errors and operator fatigue, while increasing throughput and product yield.
SPECIFICATIONS

Want to learn more about Collimated Light? Click here: Collimated Light

Model 264