PANEL TO ARTWORK REGISTRATION:
As features become smaller and registration becomes more critical, a need for greater alignment is necessary to obtain the highest yields.
Tamarack’s Model 161-AA performs automatic substrate to artwork alignment using an advanced Cognex pattern recognition system. This removes the operator from the registration process, thus completely eliminating operator induced alignment errors and thus improving yields.
Tamarack’s Model 161AA takes the registration process one step further, beyond human capability. Relative expansion or contraction between the artwork and the substrate can occur due to substrate processing procedures, temperature changes and humidity changes. This Tamarack tool can adjust for the effects of expansion or contraction so that in spite of these changes, the resulting error is minimized. This is accomplished by aligning the center of the substrate with the center of the artwork. By aligning the centers, errors due to expansion and contraction are equally distributed across the substrate. With the substrate and artwork aligned from their center points, overlay misalignment is calculated and compared with the user supplied recipe variable. If maximum overlay exceeds the amount supplied, the operator will be notified by the system priot to exposure.
RESOLUTION
All of Tamarack’s UV Exposure systems use highly collimated light to produce the most accurate artwork to panel replication possible. Tamarack's collimated exposure systems will allow its user to obtain features below 1 mil. (0.001"). Accurate replication means high yields.
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